The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 22, 2008

Filed:

Jun. 17, 2005
Applicants:

Atsushi Machida, Yokohama, JP;

Sumio Yamada, Yokohama, JP;

Hiroshi Tanaka, Yokohama, JP;

Hisanori Aizawa, Yokohama, JP;

Kenji Nagata, Yokohama, JP;

Tsutomu Miyashita, Yokohama, JP;

Hiroshi Ishikawa, Kawasaki, JP;

Inventors:

Atsushi Machida, Yokohama, JP;

Sumio Yamada, Yokohama, JP;

Hiroshi Tanaka, Yokohama, JP;

Hisanori Aizawa, Yokohama, JP;

Kenji Nagata, Yokohama, JP;

Tsutomu Miyashita, Yokohama, JP;

Hiroshi Ishikawa, Kawasaki, JP;

Assignees:

Fujitsu Media Devices Limited, Kanagawa, JP;

Fujitsu Limited, Kawasaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01P 15/12 (2006.01);
U.S. Cl.
CPC ...
Abstract

An acceleration sensor that suppresses fluctuations in the offset voltage and with an enhanced temperature characteristic is provided. The acceleration sensor comprises an weight that is formed in the center of a semiconductor substrate; a frame that is formed at the circumference of the weight; a beam or diaphragm that connects the weight and frame; a detection element that is formed on the beam or diaphragm and which detects bending of the beam or diaphragm that corresponds with the applied acceleration; and a lead that is formed on the beam or diaphragm and which guides the detection output of the detection element to a pad that is provided on the frame, wherein a dummy lead comprising a plurality of dot patterns which are at least electrically independent of the lead formed on the beam or diaphragm is formed on the beam or diaphragm.


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