The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 22, 2008
Filed:
Apr. 07, 2005
Norio Sato, Kanagawa, JP;
Katsuyuki Machida, Kanagawa, JP;
Hakaru Kyuragi, Tokyo, JP;
Satoshi Shigematsu, Kanagawa, JP;
Hiroki Morimura, Kanagawa, JP;
Hiromu Ishii, Kanagawa, JP;
Toshishige Shimamura, Kanagawa, JP;
Norio Sato, Kanagawa, JP;
Katsuyuki Machida, Kanagawa, JP;
Hakaru Kyuragi, Tokyo, JP;
Satoshi Shigematsu, Kanagawa, JP;
Hiroki Morimura, Kanagawa, JP;
Hiromu Ishii, Kanagawa, JP;
Toshishige Shimamura, Kanagawa, JP;
Nippon Telegraph and Telephone Corporation, Tokyo, JP;
Abstract
A method of manufacturing a surface shape recognition sensor. A sacrificial film is formed on an interlevel dielectric to cover a lower electrode while keeping an upper portion of a support electrode exposed. An upper electrode is formed on the sacrificial film and support electrode. The sacrificial film is selectively removed and a protective film is formed on the upper electrode. A photosensitive resin film having photosensitivity is formed on the protective film. A plurality of projections are formed in a region of the protective film above a capacitive detection element. In this manner a plurality of capacitive detection elements each having the lower electrode and upper electrode are formed.