The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7359034 B1

PDF
Full Text
Expired
Date of Patent:
Apr. 15, 2008

Filed:

Mar. 10, 2006
Applicant:

Yuuki Ishii, Yokohama, JP;

Inventor:

Yuuki Ishii, Yokohama, JP;

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03B 27/58 (2006.01);
U.S. Cl.
CPC ...
Abstract

An exposure apparatus in which by filling at least a portion between a projection optical system and a substrate with a liquid and by projecting an image of a pattern onto the substrate via said projection optical system and said liquid, said substrate is exposed, said exposure apparatus includes: a substrate holding member that holds said substrate and keeps liquid so that said substrate is immersed in the liquid; and a liquid supply mechanism that supplies, at a vicinity of the projection area of said projection optical system, liquid onto said substrate from above said substrate.


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Ishii, Yuuki. (2008). Exposure apparatus and device manufacturing method (U.S. Patent No. 7359034). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7359034

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