The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 2008
Filed:
Jan. 12, 2006
Applicants:
Mitsuhiro Tomita, Tokyo, JP;
Hiroki Tanaka, Kanagawa, JP;
Masahiko Yoshiki, Kanagawa, JP;
Inventors:
Assignee:
Kabushiki Kaisha Toshiba, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/252 (2006.01); H01J 49/14 (2006.01); G01N 23/225 (2006.01); G01N 23/227 (2006.01);
U.S. Cl.
CPC ...
Abstract
A deconvolution analysis apparatus includes a sputtering rate calibrating unit that calibrates a depth profile resulting from a depth analysis on a sample to be estimated by using a sputtering surface analysis, according to a depth change of a sputtering rate in an initial sputtering; and a deconvolution analysis unit that performs a deconvolution analysis on the depth profile whose depth axis is extended, so as to make a depth change of a depth resolution in the initial sputtering apparently constant.