The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 2008
Filed:
Sep. 18, 2001
Min-jin Ko, Seoul, KR;
Myung-sun Moon, Daejeon, KR;
Dong-seok Shin, Seoul, KR;
Jung-won Kang, Seoul, KR;
Hye-yeong Nam, Cheongju, KR;
Min-Jin Ko, Seoul, KR;
Myung-Sun Moon, Daejeon, KR;
Dong-Seok Shin, Seoul, KR;
Jung-Won Kang, Seoul, KR;
Hye-Yeong Nam, Cheongju, KR;
LG Chem, Ltd., , KR;
Abstract
The present invention relates to a low dielectric material essential for a next generation electric device such as a semiconductor device, with a high density and high performance. In detail, the present invention provides: a process for preparing an organic silicate polymer comprising a polymerization step in the absence of homogenizing organic solvents, of mixing and reacting organic silane compounds with water in the presence of a catalyst to hydrolyze and condense the silane compounds, that is thermally stable and has good mechanical and crack resistance properties; and a coating composition for forming a low dielectric insulating film; and a process for preparing a low dielectric insulating film using the organic silicate polymer prepared according to the process, and an electric device comprising the low dielectric insulating film prepared according to the process.