The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 2008
Filed:
Mar. 30, 2005
Chia-sheng Lee, Taichung, TW;
Han-tu Lin, Wuci Township, Taichung County, TW;
Jia-fam Wong, Hsinchu, TW;
Chia-Sheng Lee, Taichung, TW;
Han-Tu Lin, Wuci Township, Taichung County, TW;
Jia-Fam Wong, Hsinchu, TW;
AU Optronics Corp., Hsinchu, TW;
Abstract
A Method of forming microelectromechanical optical display devices is provided. A sacrificial layer is formed above a substrate. A plurality of posts penetrating the sacrificial layer is formed. A reflective layer and a flexible layer are sequentially formed above the sacrificial layer and the posts. A photoresist layer is formed on part of the flexible layer. By performing wet etching using the photoresist layer as a mask, a portion of the flexible layer is removed to form a patterned flexible layer. The wet etching is stopped on the reflective layer. The photoresist layer is removed. By performing dry etching using the patterned flexible layer as a mask, a portion of the reflective layer is removed to form a patterned reflective layer. A mechanical layer is formed with the patterned flexible and reflective layers. The sacrificial layer is removed to release the mechanical layer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile