The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 2008
Filed:
Nov. 30, 2005
Ikuo Shimizu, Yokkaichi, JP;
Katsuhiro Ito, Yokkaichi, JP;
Kazuyasu Osada, Yokkaichi, JP;
Tsuguo Yamaoka, Funabashi, JP;
Ikuo Shimizu, Yokkaichi, JP;
Katsuhiro Ito, Yokkaichi, JP;
Kazuyasu Osada, Yokkaichi, JP;
Tsuguo Yamaoka, Funabashi, JP;
Kyowa Yuka Co., Ltd., Tokyo, JP;
Abstract
The present invention provides the following process for production of an ether compound, which is useful for chemical amplification type resist compositions, synthetic intermediates of pharmaceuticals, paints, or the like, with less side reaction and in high yield. A process for producing an ether compound having a group represented by the general formula (II) wherein R, Rand Rmay be the same or different, and represent substituted or unsubstituted alkyl, substituted or unsubstituted aryl or substituted or unsubstituted aralkyl, or Rand Rform cycloalkyl together with an adjacent carbon atom, which comprises allowing a compound having a hydroxyl group (including a carboxyl group) to react with an alkenyl ether represented by the general formula (I) wherein R, Rand Rhave the same significances as defined above, respectively.