The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 2008
Filed:
Sep. 15, 2005
Dietmar Dudek, Langen, DE;
Mark A. Hackler, Ocean, NJ (US);
Robert A. Mcmillen, Downingtown, PA (US);
Allan Banke, Nyborg, DK;
Dietmar Dudek, Langen, DE;
Mark A. Hackler, Ocean, NJ (US);
Robert A. McMillen, Downingtown, PA (US);
Allan Banke, Nyborg, DK;
E. I. du Pont de Nemours and Company, Wilmington, DE (US);
Abstract
This invention relates to a method for thermally developing a photosensitive element to form a relief pattern. The method includes heating a composition layer of the element to cause a portion of the layer to liquefy and providing a development medium under tension to the element to absorb the liquefied composition. The development medium includes an absorbent material and a support, the combination of which minimizes stretch and distortion of the absorbent material and can impede the migration of the liquefied composition through the absorbent material.