The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 2008
Filed:
Apr. 28, 2004
David R. Williams, Fairport, NY (US);
Raymond A. Applegate, Kingwood, TX (US);
Larry N. Thibos, Bloomington, IN (US);
David R. Williams, Fairport, NY (US);
Raymond A. Applegate, Kingwood, TX (US);
Larry N. Thibos, Bloomington, IN (US);
University of Rochester, Rochester, NY (US);
University of Houston, Houston, TX (US);
Indiana University, Bloomington, IN (US);
Abstract
Several metrics to predict the subjective impact of the eye's wavefront aberrations are presented. The metrics can be based on RMS wavefront errors or slopes, the area of the critical pupil, a curvature parameter, the point spread function, the optical transfer function, or the like. Other techniques include the fitting of a sphero-cylindrical surface, the use of multivariate metrics, and customization of the metric for patient characteristics such as age.