The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2008
Filed:
Jul. 21, 2004
Hyeong Joon Kim, Gyeonggi-do, KR;
Jae Bin Lee, Seoul, KR;
Heung Rae Kim, Chungcheongbuk-do, KR;
Ki Bong Yeo, Chungcheongbuk-do, KR;
Young-soo Lee, Chungcheongnam-do, KR;
Hyeong Joon Kim, Gyeonggi-do, KR;
Jae Bin Lee, Seoul, KR;
Heung Rae Kim, Chungcheongbuk-do, KR;
Ki Bong Yeo, Chungcheongbuk-do, KR;
Young-Soo Lee, Chungcheongnam-do, KR;
Sangshin Elecom Co., Ltd, Chungcheongnam-do, KR;
Abstract
The present invention relates to a film bulk acoustic wave device and a method of manufacturing the same, wherein comprising an acoustic reflective layer which is formed on a substrate by removing a sacrificial layer on the substrate and becomes an empty space; an oxidation protective film or etch protecting film which is formed in a pattern that divides a resonance region to form the acoustic reflective layer on the sacrificial layer; a thermal oxidation film which is formed by partially thermally oxidizing the sacrificial layer in an electrode region where the oxidation protective film or the etch protecting film is not formed; and a lower electrode, a piezoelectric thin film, and an upper electrode all of which are disposed on the thermal oxide. Further, the present invention is directed to a method of manufacturing the same.