The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2008
Filed:
May. 17, 2006
Applicants:
Shang-hyeun Park, Boryeong-si, KR;
Young-hwan Kim, Wilmington, DE (US);
Inventors:
Shang-Hyeun Park, Boryeong-si, KR;
Young-Hwan Kim, Wilmington, DE (US);
Assignees:
Samsung SDI Co., Ltd., Suwon-si, Gyeonggi-do, KR;
E.I. Du Pont De Nemours and Company, Wilmington, DE (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of manufacturing a field emission device (FED) using a photoresist for performing multi-patterning processes, whereby different structures can be multi-patterned using a single photoresist mask. The photoresist has a solubility to a solvent by post-exposure heat-treatment, and a complicated structure can be formed using the photoresist.