The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2008
Filed:
May. 09, 2005
Gregory Breyta, San Jose, CA (US);
Daniel Joseph Dawson, San Jose, CA (US);
Carl E. Larson, San Jose, CA (US);
Gregory Michael Wallraff, Morgan Hill, CA (US);
Gregory Breyta, San Jose, CA (US);
Daniel Joseph Dawson, San Jose, CA (US);
Carl E. Larson, San Jose, CA (US);
Gregory Michael Wallraff, Morgan Hill, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A class of lithographic photoresist combinations is disclosed which is suitable for use with visible light and does not require a post-exposure bake step. The disclosed photoresists are preferably chemical amplification photoresists and contain a photosensitizer having the structure of formula (I): where Arand Arare independently selected from monocyclic aryl and monocyclic heteroaryl, Rand Rmay be the same or different, and have the structure —X—Rwhere X is O or S and Ris C-Chydrocarbyl or heteroatom-containing C-Chydrocarbyl, and Rand Rare independently selected from the group consisting of hydrogen and —X—R, or, if ortho to each other, may be taken together to form a five- or six-membered aromatic ring, with the proviso that any heteroatom contained within Ar, Ar, or Ris O or S. The use of the disclosed photoresists, particularly for the manufacture of holographic diffraction gratings, is also disclosed.