The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2008
Filed:
Aug. 10, 2006
Naruhisa Nagata, Matsumoto, JP;
Naruhisa Nagata, Matsumoto, JP;
Abstract
A method of forming a protective film that restrains gas adsorption while preserving durability and corrosion resistance of a plasma CVD carbon film is disclosed. A protective film of a slide-resistant member is deposited by means of a plasma CVD method using a raw material of hydrocarbon gas, wherein a bias voltage higher than −500 V is applied to the slide-resistant member in an initial stage of depositing the protective film, and a bias voltage of −500 V or lower is applied in a final stage of deposition. A proportion of time duration of the final stage is preferably at most 25% of the total time for depositing the protective film. A magnetic recording medium comprising a magnetic recording layer and a protective film formed by the method also is disclosed.
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