The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2008
Filed:
Nov. 19, 2004
Takeshi Hidaka, Tokyo, JP;
Hiroaki Kasai, Tokyo, JP;
Masamichi Hijino, Kitatsuru-gun, JP;
Yasushi Nakamura, Kitatsuru-gun, JP;
Akihiro Koyama, Takarazuka, JP;
Keiji Tsunetomo, Amagasaki, JP;
Junji Kurachi, Takarazuka, JP;
Hirotaka Koyo, Takarazuka, JP;
Shinya Okamoto, Osaka, JP;
Yasuhiro Saito, Takatsuki, JP;
Takeshi Hidaka, Tokyo, JP;
Hiroaki Kasai, Tokyo, JP;
Masamichi Hijino, Kitatsuru-gun, JP;
Yasushi Nakamura, Kitatsuru-gun, JP;
Akihiro Koyama, Takarazuka, JP;
Keiji Tsunetomo, Amagasaki, JP;
Junji Kurachi, Takarazuka, JP;
Hirotaka Koyo, Takarazuka, JP;
Shinya Okamoto, Osaka, JP;
Yasuhiro Saito, Takatsuki, JP;
Olympus Corporation, Tokyo, JP;
Nippon Sheet Glass Co., Ltd., Tokyo, JP;
Abstract
A processing method for glass substrate of the present invention includes: applying heat and external force to a glass substrate and then cooling it down to thereby form a compression stressed part having a different etching rate from that of other parts with respect to an etching reagent to be used, on the surface of the glass substrate and in the vicinity thereof, and performing chemical etching using the etching reagent on the glass substrate having the compression stressed part formed thereon, so as to form a relief on the surface of the glass substrate.