The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2008
Filed:
Aug. 04, 2004
Gary A. Kneezel, Webster, NY (US);
John A. Lebens, Rush, NY (US);
Christopher N. Delametter, Rochester, NY (US);
David P. Trauernicht, Rochester, NY (US);
James M. Chwalek, Pittsford, NY (US);
Gary A. Kneezel, Webster, NY (US);
John A. Lebens, Rush, NY (US);
Christopher N. Delametter, Rochester, NY (US);
David P. Trauernicht, Rochester, NY (US);
James M. Chwalek, Pittsford, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
A method of etching a substrate and an article(s) formed using the method are provided. The method includes providing a substrate; coating a region of the substrate with a temporary material having properties that enable the temporary material to remain substantially intact during subsequent processing and enable the temporary material to be removed by a subsequent process that allows the substrate to remain substantially unaltered; removing a portion of the substrate to form a feature, at least some of the removed portion of the substrate overlapping at least a portion of the coated region of the substrate while allowing the temporary material substantially intact; and removing the temporary material while allowing the substrate to remain substantially unaltered.