The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 08, 2008

Filed:

Aug. 05, 2003
Applicants:

Takeshi Okada, Kanagawa, JP;

Katsuhiko Takano, Kanagawa, JP;

Junichi Sakamoto, Kanagawa, JP;

Shoji Shiba, Kanagawa, JP;

Kenichi Iwata, Tokyo, JP;

Hiroshi Taniuchi, Kanagawa, JP;

Takehito Nishida, Tokyo, JP;

Yoshikatsu Okada, Kanagawa, JP;

Inventors:

Takeshi Okada, Kanagawa, JP;

Katsuhiko Takano, Kanagawa, JP;

Junichi Sakamoto, Kanagawa, JP;

Shoji Shiba, Kanagawa, JP;

Kenichi Iwata, Tokyo, JP;

Hiroshi Taniuchi, Kanagawa, JP;

Takehito Nishida, Tokyo, JP;

Yoshikatsu Okada, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01); C25F 3/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An optical element comprising at least a plurality of pixels formed on a substrate and partition walls arranged respectively between adjacent pixels is manufactured by a method comprising steps of forming partition walls of a resin composition on a substrate, performing a dry etching process by irradiating the substrate carrying the partition walls formed thereon with plasma in an atmosphere containing gas selected from oxygen, argon and helium, performing a plasma treatment process by irradiating the substrate subjected to the dry etching process with plasma in an atmosphere containing at least fluorine atoms, and forming pixels by applying ink to the areas surrounded partition walls by means of an ink-jet system.


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