The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 01, 2008
Filed:
Jul. 26, 2002
Nathalie Landraud, Lyons, FR;
Jacques Peretti, Paris, FR;
Frédéric Chaput, Massy, FR;
Georges Lampel, Paris, FR;
Jean-pierre Boilot, Meudon la Foret, FR;
Khalid Lahlil, Orsay, FR;
Viatcheslav Safarov, Arcueil, FR;
Nathalie Landraud, Lyons, FR;
Jacques Peretti, Paris, FR;
Frédéric Chaput, Massy, FR;
Georges Lampel, Paris, FR;
Jean-Pierre Boilot, Meudon la Foret, FR;
Khalid Lahlil, Orsay, FR;
Viatcheslav Safarov, Arcueil, FR;
Essilor International Compagnie Generale d'Optique, Charenton Cedex, FR;
Abstract
The invention generally concerns a method involving emitting polarization light waves through an aperture with a dimension of maximum size lower than or equal to 100 nm, wherein the aperture is circumferentially bound by an opaque area that prevents the light waves from being propagated outside the aperture during use, and wherein the emitted polarization light waves (1) contact a material layer comprising a photosensitive compound whose surface is located at a distance lower than 100 nm from said aperture, and (2) induce a topographic modification of the material layer. In this manner, a stable structure is printed in relief in the material layer without requiring any additional development step. The invention is applicable, in certain embodiments, to ophthalmic optics.