The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 01, 2008
Filed:
Aug. 10, 2005
Daniel A. Corliss, Hopewell Junction, NY (US);
Dario L. Goldfarb, Mohegan Lake, NY (US);
Steven J. Holmes, Guilderland, NY (US);
Kurt R. Kimmel, Waterford, NY (US);
Michael J. Lercel, Austin, TX (US);
Daniel A. Corliss, Hopewell Junction, NY (US);
Dario L. Goldfarb, Mohegan Lake, NY (US);
Steven J. Holmes, Guilderland, NY (US);
Kurt R. Kimmel, Waterford, NY (US);
Michael J. Lercel, Austin, TX (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A novel arrangement and method for depositing evaporation control agents so as to coat immersion lithographic solutions which are employed on the surface of semiconductor wafers in connection with the etching of the surfaces of the wafer through the intermediary of an immersion lithographic process.