The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2008
Filed:
Nov. 02, 2005
Ming-jong Shiau, Cerritos, CA (US);
Phu H. Tran, Huntington Beach, CA (US);
Alex T. Chau, Rancho Palos Verdes, CA (US);
Mark Kintis, Manhattan Beach, CA (US);
George W. Schreyer, Torrance, CA (US);
Ming-Jong Shiau, Cerritos, CA (US);
Phu H. Tran, Huntington Beach, CA (US);
Alex T. Chau, Rancho Palos Verdes, CA (US);
Mark Kintis, Manhattan Beach, CA (US);
George W. Schreyer, Torrance, CA (US);
Northrop Grumman Corporation, Los Angeles, CA (US);
Abstract
An LC filter structure and method for its fabrication, in which multiple shunt capacitors, multiple shunt inductors and multiple coupling inductors are printed on a metal layer formed on a thin dielectric substrate. The capacitors have first electrodes that are formed as spatially separated regions of the metal layer, and a common second electrode formed by a ground plane on the substrate. The shunt inductors are formed as spiral traces connected to the separated regions and to the ground plane, through conductive vias. The coupling inductors are similarly formed as spiral traces in the gaps between the separated regions, the ends of each coupling inductor being connected to respective adjacent regions of the metal layer.