The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2008
Filed:
Nov. 11, 2005
Bernd Laser, Stuhr, DE;
Bernd Laser, Stuhr, DE;
VACUTEC Hochvakuum- & Präzisionstechnik GmbH, Bremen, DE;
Abstract
A method for the production of a multipolar electrode configuration () for focussing or mass filtration of a beam of charged particles includes attaching a number of round-pole shaped electrode blanks ()—but only a fraction of the total number of electrodes () required for said electrode configuration ()—to one or a number of support elements (); simultaneous processing of the end parts () of the support element(s) () and of the electrode blanks () attached to the support element(s) () in one process step in such a way that each electrode blank () is processed into an electrode () with a cross section, having a circular section (KA) and a non-circular, section (HA), and at the end of said simultaneous processing the support element(s) () having two differently shaped end parts (), whereby the respective shapes of said end parts () are adapted to each other.