The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2008
Filed:
Apr. 08, 2003
Kazuyuki Miyazawa, Yokohama, JP;
Toshio Yanaki, Yokohama, JP;
Francoise M. Winnik, Westmount, CA;
Shiseido Company, Ltd., Tokyo, JP;
Abstract
The present invention is a method for manufacturing a phosphorylcholine group-containing polysaccharide wherein the aldehyde derivative-containing compound obtained by the oxidative ring-opening reaction of glycerophosphorylcholine is added to a polysaccharide containing amino groups as well as a new polysaccharide having phosphorylcholine groups obtained from this manufacturing method. The object of the present invention is to provide a phosphorylcholine group-containing polysaccharide that is superior in biocompatibility and moisture retention, and is useful as a polymer material for medical use, as well as a simple method of manufacturing it. The polysaccharide of the present invention is utilized, for example, in artificial organs, biomembranes, coating agents for medical tools, drug delivery, and in cosmetics.