The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2008
Filed:
Oct. 26, 2001
David F. Bocian, Riverside, CA (US);
Werner G. Kuhr, Oak Hills, CA (US);
Jonathan S. Lindsey, Raleigh, NC (US);
Rajeeve Balkrishna Dabke, Columbus, OH (US);
Zhiming Liu, Riverside, CA (US);
David F. Bocian, Riverside, CA (US);
Werner G. Kuhr, Oak Hills, CA (US);
Jonathan S. Lindsey, Raleigh, NC (US);
Rajeeve Balkrishna Dabke, Columbus, OH (US);
Zhiming Liu, Riverside, CA (US);
The Regents of the University of California, Oakland, CA (US);
The North Carolina State University, Raleigh, NC (US);
Abstract
This invention provides a new method of forming a self-assembling monolayer (SAM) of alcohol-terminated or thiol-terminated organic molecules (e.g. ferrocenes, porphyrins, etc.) on a silicon or other group IV element surface. The assembly is based on the formation of an E-O— or an E-S— bond where E is the group IV element (e.g. Si, Ge, etc.). The procedure has been successfully used on both P- and n-type group IV element surfaces. The assemblies are stable under ambient conditions and can be exposed to repeated electrochemical cycling.