The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2008
Filed:
Apr. 09, 2003
Koji Ichimura, Shinjuku-Ku, JP;
Koji Ichimura, Shinjuku-Ku, JP;
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Abstract
A low refractive index SiOfilm is provided which uses a starting material for forming an SiOfilm and has a lower refractive index than the conventional SiOfilm. A starting material gas comprising a gas containing a fluorine atom, a gas containing a silicon atom and an alkyl group having 1 to 4 carbon atoms or an alkyl group having 1 to 4 carbon atoms with a part or the whole of hydrogen atoms substituted by a fluorine atom, and a gas containing an oxygen atom is subjected to plasma CVD in a vacuum chamberto form an SiOfilm on a webin a plasma zone. The SiOfilm thus formed has, at least one low refractive index element selected from a fluorine atom, an alkyl group having 1 to 4 carbon atoms, and an alkyl group having 1 to 4 carbon atoms with a part or the whole of hydrogen atoms substituted by a fluorine atom, and the SiOfilm with the low refractive index element introduced thereinto has a lower refractive index than an SiOfilm with the low refractive index element not introduced thereinto.