The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 18, 2008

Filed:

Oct. 11, 2006
Applicants:

Byeongju Park, Plainview, NY (US);

Deok-kee Kim, Bedford Hills, NY (US);

John M. Safran, Wappingers Falls, NY (US);

Inventors:

Byeongju Park, Plainview, NY (US);

Deok-Kee Kim, Bedford Hills, NY (US);

John M. Safran, Wappingers Falls, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11C 17/18 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for programming an electronically programmable semiconductor fuse applies a programming current to a fuse link as a series of multiple pulses. The fuse link has a nominal maximum programming current and corresponding combinations of a programming voltage and a gate voltage associated with the nominal maximum programming current. A first programming current pulse is generated to provide a programming current less than the maximum programming current. The first programming current pulse causes electromigration to increase the resistance of the fuse link. A subsequent programming current pulse is applied using a combination of gate voltage and programming voltages which if applied to the fuse link absent any electromigration would result in a programming current greater than the nominal maximum programming current. However, the resistance created by the first programming pulse reduces the programming current of the subsequent programming pulse to a level below the maximum programming current.


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