The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2008
Filed:
Jan. 13, 2006
Wei-hsiao Chen, Hsinhua, TW;
Wei-Hsiao Chen, Hsinhua, TW;
Himax Technologies, Inc., Hsinhua, Tainan County, TW;
Abstract
The invention relates to a method for manufacturing a mirror device with anti-reflective coating layer. The method of the invention comprises: (a) forming an anti-reflective metal film on a first surface of a mirror material to be a mirror device; (b) defining a plurality of mirror units from the mirror device, each mirror unit having a mirror layer and an anti-reflective metal film unit, the anti-reflective metal film unit formed on a first surface of the mirror layer; and (c) defining an anti-reflective coating layer from the anti-reflective metal film unit, the anti-reflective coating layer formed on edges of the first surface of the mirror layer. According to the invention, the anti-reflective coating layer on the mirror layer can shield a bright area caused by fringe effect so as to minimize the bad influence of the fringe effect. In manufacture, the method of the invention follows the semiconductor manufacturing process, and has high precision and simple process.