The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2008
Filed:
Oct. 22, 2003
Applicant:
Dustin A. Cochran, Watsonville, CA (US);
Inventor:
Dustin A. Cochran, Watsonville, CA (US);
Assignee:
Seagate Technology LLC, Scotts Valley, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B23H 3/00 (2006.01); C25F 7/00 (2006.01); C25F 3/14 (2006.01);
U.S. Cl.
CPC ...
Abstract
A system and method are described for radially positioning a workpiece for electrochemical machining. In one embodiment, a pressurized air chamber is configured to contain pressurized air. In addition, an expandable diaphragm is configured to position the workpiece radially relative to an electrode assembly in response to the pressurized air being released into the pressurized air chamber.
Cochran, Dustin. (2008). System and method for radially positioning a workpiece for electrochemical machining (U.S. Patent No. 7344623). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7344623
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile