The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2008
Filed:
Dec. 30, 2005
Seiichi Sagara, Chiba, JP;
Atsushi Ishimaru, Tokyo, JP;
Seiichi Sagara, Chiba, JP;
Atsushi Ishimaru, Tokyo, JP;
Sony Corporation, Tokyo, JP;
Abstract
The present invention has been made to adequately and quickly adjust the spherical aberration and focus bias in an optical pickup. In the present invention, evaluation values are measured on a plurality of respective measurement points each determined by a combination of a spherical aberration correction value and focus bias value and a two-variable function having the spherical aberration correction value and focus bias value as variables is approximated to the evaluation values. Based on the two-variable function obtained by the approximation, the optimal value of the spherical aberration correction value and focus bias value on which the evaluation value becomes optimal is calculated. As a result, it is possible to adequately and quickly adjust the spherical aberration and focus bias in an optical pickup.