The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2008
Filed:
Apr. 20, 2005
Dana E. Poulain, Overland Park, KS (US);
Ted Teuscher, Lenexa, KS (US);
Dana E. Poulain, Overland Park, KS (US);
Ted Teuscher, Lenexa, KS (US);
Preco Industries, Inc, Lenexa, KS (US);
Abstract
A method of applying a registered pattern to a continuous web of material involves determining a position of a next pattern such that the next pattern is in registration with a previous pattern, adjusting the position to maintain a transverse location relative to the web, and adjusting a rotation of the pattern so that the pattern is substantially aligned with a longitudinal axis of the web. Registration features of the web and registration features of the next pattern are used to determine longitudinal, transverse, and rotational errors between the registered position of the next pattern and the path of the web. The registered position of the next pattern is adjusted along a transverse axis of the web according to a transverse error to maintain the transverse location. A rotation of the registered position is adjusted according to an angle that is determined using the transverse error and a distance from a registration feature to a center of the pattern along a longitudinal axis of the pattern.