The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2008
Filed:
Dec. 22, 2006
Gautam Khera, Morgan Hill, CA (US);
Sanford J. Lewis, Palo Alto, CA (US);
Galina Moutchaidze, San Jose, CA (US);
Aron Pentek, San Jose, CA (US);
Hugo Alberto Emilio Santini, San Jose, CA (US);
Mason Lamar Williams, Iii, San Jose, CA (US);
Gautam Khera, Morgan Hill, CA (US);
Sanford J. Lewis, Palo Alto, CA (US);
Galina Moutchaidze, San Jose, CA (US);
Aron Pentek, San Jose, CA (US);
Hugo Alberto Emilio Santini, San Jose, CA (US);
Mason Lamar Williams, III, San Jose, CA (US);
Hitachi Global Storage Technologies Netherlands B.V., Amsterdam, NL;
Abstract
A method for fabricating a magnetic head includes forming a first pole and a flux shaping layer in spaced relation to the first pole. A nonmagnetic layer is formed adjacent the flux shaping layer and positioned on an air bearing surface (ABS) side of the flux shaping layer. A tapered recess is created in the nonmagnetic layer, the taper of the recess increasing (i.e., becoming deeper) towards the flux forming layer. The recess is filled with a magnetic material. A probe layer is formed such that it is in electrical communication with the magnetic material filling the recess.