The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 11, 2008

Filed:

Jan. 31, 2005
Applicants:

José Gomes, Douglaston, NY (US);

Man Mohan Singh, Yorktown Heights, NY (US);

Mila Keren, Nesher, IL;

Sai Zeng, Elmsford, NY (US);

Julia Rubin, Rechasim, IL;

Laurent Balmelli, White Plains, NY (US);

Ioana Boier-martin, Pelham Manor, NY (US);

Inventors:

José Gomes, Douglaston, NY (US);

Man Mohan Singh, Yorktown Heights, NY (US);

Mila Keren, Nesher, IL;

Sai Zeng, Elmsford, NY (US);

Julia Rubin, Rechasim, IL;

Laurent Balmelli, White Plains, NY (US);

Ioana Boier-Martin, Pelham Manor, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 17/30 (2006.01);
U.S. Cl.
CPC ...
Abstract

A plurality of artifacts, in a plurality of repositories, are maintained under revision control. A plurality of artifact tuples, in another repository, are maintained under revision control. At least one first artifact tuple comprise first information providing access to at least one of the artifacts. At least one second artifact tuple comprises second information providing access to at least one other artifact tuple. Each of the artifact tuples are associated with at least one of a plurality of product development processes. An apparatus comprises a plurality of repositories, each maintaining under revision control a plurality of artifacts and another repository that maintains under revision control a plurality of artifact tuples. A workflow process is adapted to allow users to associate each of the artifact tuples with at least one of a plurality of product development processes.


Find Patent Forward Citations

Loading…