The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 11, 2008
Filed:
Apr. 14, 2006
Sang Hyuck Lee, Kyungki-do, KR;
Sung Hwa Kim, Seoul, KR;
Chon Su Kyong, Seoul, KR;
Ho Seop Jeong, Kyungki-do, KR;
Sang Hyuck Lee, Kyungki-do, KR;
Sung Hwa Kim, Seoul, KR;
Chon Su Kyong, Seoul, KR;
Ho Seop Jeong, Kyungki-do, KR;
Samsung Electro-Mechanics Co., Ltd., Kyungki-Do, KR;
Abstract
Provided are wafer scale lenses having a diffraction surface as well as a refractive surface, and an optical system having the same. The wafer scale lens includes a lens substrate, a first lens element formed on the object side of the lens substrate, having a positive refractive power, a second lens element formed on the image side of the lens substrate, having a diffraction surface, and a third lens element deposited on the diffraction surface of the second lens element, having a negative refractive power. The invention allows miniaturized optical system and efficient calibration of angle of view, reducing the angle of light incident onto the diffractive surface, thereby increasing diffraction efficiency and eliminating high order diffraction light to improve picture quality.