The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 11, 2008
Filed:
Oct. 27, 2005
Nobuaki Ueki, Saitama, JP;
Koji Otsuka, Yokohama, JP;
Nobuaki Ueki, Saitama, JP;
Koji Otsuka, Yokohama, JP;
Fujinon Corporation, Saitama, JP;
Asahi Glass Company, Ltd., Tokyo, JP;
Abstract
There are carried out a first measurement operation for measuring the shape of a front surface of a sample held in a held state, a second measurement operation for measuring the shape of a back surface of the sample held in the same state, and a third measurement operation for measuring the shape of the back surface of the sample held so as to cause inverse distortion. First data are acquired on the basis of the front surface shape data obtained through the first measurement operation and the back surface shape data obtained through the second measurement operation. Second data are obtained on the basis of the front surface shape data obtained through the first measurement operation and the back surface shape data obtained through the third measurement operation. Holding distortion is determined on the basis of the first and second data.