The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 11, 2008

Filed:

Sep. 10, 2004
Applicants:

Hugh Sungki O, Fremont, CA (US);

Chih-ching Shih, Pleasanton, CA (US);

Cheng-hsiung Huang, Cupertino, CA (US);

Yow-juang Liu, San Jose, CA (US);

Inventors:

Hugh Sungki O, Fremont, CA (US);

Chih-Ching Shih, Pleasanton, CA (US);

Cheng-Hsiung Huang, Cupertino, CA (US);

Yow-Juang Liu, San Jose, CA (US);

Assignee:

Altera Corporation, San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/74 (2006.01);
U.S. Cl.
CPC ...
Abstract

A semiconductor device and method for electrostatic discharge protection. The semiconductor device includes a first semiconductor controlled rectifier and a second semiconductor controlled rectifier. The first semiconductor controlled rectifier includes a first semiconductor region and a second semiconductor region, and the second semiconductor controlled rectifier includes the first semiconductor region and the second semiconductor region. The first semiconductor region is associated with a first doping type, and the second semiconductor region is associated with a second doping type different from the first doping type. The second semiconductor region is located directly on an insulating layer.


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