The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 11, 2008
Filed:
Mar. 03, 2005
Ronald S. Cok, Rochester, NY (US);
Timothy J. Tredwell, Fairport, NY (US);
Dustin L. Winters, Webster, NY (US);
Andrea S. Rivers, Bloomfield, NY (US);
Michael L. Boroson, Rochester, NY (US);
Ronald S. Cok, Rochester, NY (US);
Timothy J. Tredwell, Fairport, NY (US);
Dustin L. Winters, Webster, NY (US);
Andrea S. Rivers, Bloomfield, NY (US);
Michael L. Boroson, Rochester, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
A method and apparatus for forming vias in one or more layers, comprising providing a vacuum chamber, one or more beams in the vacuum chamber. The array of directed beams located in alignment with a layer for ablating one or more areas of the layer for forming vias. A cold trap is also provided in the vacuum chamber that is in fixed alignment with respect to the one or more beams such that the ablated material condenses upon the cold trap at the time and location when the one or more vias is being formed.