The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 11, 2008
Filed:
Jun. 07, 2004
Kun-jung Tsai, Tu-Chen, TW;
Kun-Jung Tsai, Tu-Chen, TW;
Hon Hai Precision Industry Co., Ltd., Tu-Cheng, Taipei Hsien, TW;
Abstract
A method for fabricating a patterned core for a light guide plate includes: providing a substrate (); coating a photo-resist layer () on the substrate; exposing the photo-resist layer to light using a photo-mask (), the photo-mask having patterns, wherein a line-width of each pattern is less than that of a corresponding pattern of the patterned core; developing the photo-resist layer; wet etching the substrate; and removing remaining photo-resist from the substrate. Because of the isotropic directionality of the wet etching, the horizontal component of the etching can appreciably enlarge a horizontal dimension of each etched area, thereby compensating for the difference in size between each pattern of the photo-mask and the corresponding pattern of the finished core. Thus, only one semiconductor process having an exposing, a developing and an etching step is needed to fabricate the core having fine patterns. The method is relatively simple, and reduces operating costs.