The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 11, 2008
Filed:
Jan. 10, 2005
Applicants:
Xiaoming Wu, Strongsville, OH (US);
Larry F. Rhodes, Silver Lake, OH (US);
Lawrence Seger, Gates Mills, OH (US);
Inventors:
Xiaoming Wu, Strongsville, OH (US);
Larry F. Rhodes, Silver Lake, OH (US);
Lawrence Seger, Gates Mills, OH (US);
Assignee:
Promerus LLC, Brecksville, OH (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/033 (2006.01); G03F 7/30 (2006.01);
U.S. Cl.
CPC ...
Abstract
The disclosed invention relates to novel norborne-type monomers containing pendent lactone or sultone groups. The invention also relates to norborne-type polymers and copolymers containing pendent lactone or sultone groups. These polymers and copolymers are useful in making photoimagable materials. The photoimagable materials are particularly suitable for use in photoresist compositions useful in 193 and 157 nm photolithography.