The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 11, 2008

Filed:

Mar. 25, 2003
Applicant:

Barry T. Eagan, Salt Lake City, UT (US);

Inventor:

Barry T. Eagan, Salt Lake City, UT (US);

Assignee:

Bausch & Lomb Incorporated, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61B 3/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

An improved moiré deflectometer device for measuring a wavefront aberration of an optical system includes a light source for illuminating a surface area of the optical system, an optical relay system for directing scattered light to a deflectometer component that converts the wavefront into a moiré fringe pattern, a sensor/camera assembly for imaging and displaying the exit pupil of the optical system and the moiré´ fringe pattern, and a fringe pattern to calculate the wavefront aberration of the optical system, being improved by an illumination source for illuminating the exit pupil of the optical system; and an alignment system cooperating with the illumination source in such a manner to consistently and accurately align a measurement axis of the device to the optical system. An associated method is also disclosed.


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