The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 04, 2008

Filed:

Feb. 13, 2004
Applicants:

James J. Coleman, Monticello, IL (US);

S. David Roh, Allen, TX (US);

Inventors:

James J. Coleman, Monticello, IL (US);

S. David Roh, Allen, TX (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01S 5/00 (2006.01); H01S 3/10 (2006.01); H01S 3/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

Dual-wavelength operation is easily achieved by biasing the gain section. Multiple gratings spaced apart from each other are separated from an output aperture by a gain section. A relatively low coupling coefficient, κ, in the front grating reduces the added cavity loss for the back grating mode. Therefore, the back grating mode reaches threshold easily. The space section lowers the current induced thermal interaction between the two uniform grating sections, significantly reducing the inadvertent wavelength drift. As a result, a tunable mode pair separations (Δλ) as small as 0.3 nm and as large as 6.9 nm can be achieved.


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