The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2008
Filed:
Aug. 30, 2005
Applicant:
Soo-han Kim, Suwon-si, KR;
Inventor:
Soo-Han Kim, Suwon-si, KR;
Assignee:
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03B 27/32 (2006.01); G01B 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Exposure equipment adapted for use in the manufacture of semiconductor devices and a related control are disclosed. A wafer stage in the exposure equipment comprises an image sensor adapted to detect patterned light from the reticle. Image data corresponding to the detected patterned light is compared to reference image data to verify a state of overlay mismatch of reticle pattern accuracy prior to wafer exposure.
Kim, Soo-Han. (2008). Exposure equipment and related control method (U.S. Patent No. 7339651). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7339651
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile