The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 04, 2008

Filed:

Dec. 20, 2004
Applicant:

Paul H. Kempf, Santa Ana, CA (US);

Inventor:

Paul H. Kempf, Santa Ana, CA (US);

Assignee:

Newport Fab, LLC, Newport Beach, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/082 (2006.01); H01L 27/102 (2006.01); H01L 29/70 (2006.01); H01L 31/11 (2006.01);
U.S. Cl.
CPC ...
Abstract

According to an exemplary embodiment, a structure includes a silicon-on-insulator substrate including a buried oxide layer situated over a bulk silicon substrate and a silicon layer situated over the buried oxide layer. The structure further includes a trench formed in the silicon layer and the buried oxide layer, where the trench has a bottom surface and a first and a second sidewall, and where the trench is situated adjacent to an optical region of the silicon-on-insulator substrate. According to this exemplary embodiment, the structure further includes an epitaxial layer situated in the trench and situated on the bulk silicon substrate, where the epitaxial layer and the bulk silicon substrate form a bulk silicon electronic region of the silicon-on-insulator substrate. The structure further includes a base of a bipolar transistor situated on the epitaxial layer, where the base can be silicon-germanium.


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