The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2008
Filed:
May. 25, 2007
Philip Marriott, Cheshire, GB;
Philip Marriott, Cheshire, GB;
Abstract
The present invention relates to inductively coupled plasma mass spectrometry (ICPMS) in which a collision cell is employed to selectively remove unwanted artifact ions from an ion beam by causing them to interact with a reagent gas. The present invention provides a first evacuated chamber () at high vacuum located between an expansion chamber () and a second evacuated chamber () containing the collision cell (). The first evacuated chamber () includes a first ion optical device (). The collision cell () contains a second ion optical device (). The provision of the first evacuated chamber () reduces the gas load on the collision cell (), by minimising the residual pressure within the collision cell () that is attributable to the gas load from the plasma source (). This serves to minimise the formation, or re-formation, of unwanted artifact ions in the collision cell ().