The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2008
Filed:
Nov. 23, 2005
Edward Raymond Engbrecht, Austin, TX (US);
Satyavolu Srinivas Papa Rao, Garland, TX (US);
Sameer Kumar Ajmera, Richardson, TX (US);
Stephan Grunow, Wappingers Falls, NY (US);
Edward Raymond Engbrecht, Austin, TX (US);
Satyavolu Srinivas Papa Rao, Garland, TX (US);
Sameer Kumar Ajmera, Richardson, TX (US);
Stephan Grunow, Wappingers Falls, NY (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
A device employs damascene layers with a pore sealing liner and includes a semiconductor body. A metal interconnect layer comprising a metal interconnect is formed over the semiconductor body. A dielectric layer is formed over the metal interconnect layer. A conductive trench feature and a conductive via feature are formed in the dielectric layer. A pore sealing liner is formed only along sidewall of the conductive via feature and along sidewalls and bottom surfaces of the conductive trench feature. The pore sealing liner is not substantially present along a bottom surface of the conductive via feature.