The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2008
Filed:
May. 10, 2004
Applicants:
Venkat Selvamanickam, Wynantskill, NY (US);
Xuming Xiong, Niskayuna, NY (US);
Inventors:
Venkat Selvamanickam, Wynantskill, NY (US);
Xuming Xiong, Niskayuna, NY (US);
Assignee:
Superpower, Inc., Schenectady, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L 39/24 (2006.01); B05D 5/12 (2006.01); C23C 14/08 (2006.01); C23C 14/48 (2006.01); C23C 14/54 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of forming a superconductive device is provided, including providing a substrate having a dimension ratio of not less than about 10, depositing a buffer film to overlie the substrate by ion beam assisted deposition utilizing and ion beam, monitoring spatial ion beam density of the ion beam over a target area, and depositing a superconductor layer to overlie the buffer film. Monitoring may be carried out by utilizing an ion detector having an acceptance angle of not less than 10°.