The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2008
Filed:
Feb. 27, 2003
Terence J Shepherd, Malvern, GB;
Paul R Tapster, Malvern, GB;
Terence J Shepherd, Malvern, GB;
Paul R Tapster, Malvern, GB;
Qinetiq Limited, London, GB;
Abstract
A novel method of fabrication of periodic dielectric composites involving a flexible computer design stage, rapid growth of a second dielectric component. Laser stereolithography is used to form the polymer material layer by layer by photopolymerisation of a liquid. Certain materials constructed in this fashion exhibit a complete loss-free barrier to microwave propagation through the material for a desired band of frequencies and are commonly known as photonic band gap crystals. Such materials could provide a novel medium for all-angle wide- and narrow-band blocking filters, narrow-band transmission filters, reflective and loss-free substrates for planar antennas, and novel loss-free media for oscillator cavities and waveguides. In addition a novel crystal structure, particularly suited to the fabrication method mentioned above and consisting of concatenated polyhedrons, is revealed.