The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 04, 2008

Filed:

May. 14, 2001
Applicants:

Hajime Hiranga, Yawara-mura, JP;

Tatauya Hoshino, Ushiku, JP;

Itoh Hiromichi, Kogonei, JP;

Inventors:

Hajime Hiranga, Yawara-mura, JP;

Tatauya Hoshino, Ushiku, JP;

Itoh Hiromichi, Kogonei, JP;

Assignees:

Pall Corporation, East Hills, NY (US);

Koganei Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 35/30 (2006.01);
U.S. Cl.
CPC ...
Abstract

A filtration system comprising a manifold and a filter having fittings, wherein a carriage supporting the filter is operatively associated with a mounting mechanism to move the fitter between a position in which the filter is spaced from the manifold and a position in which a fitting of the filter engages a fitting of the manifold. The mounting mechanism includes a pivotable lever arrangement. The pivotable lever arrangement includes a lever, a pivot pin, and a pin and slot assembly. The lever pivots about the pivot pin and the pin of the pin and slot assembly slides between a first location and a second location in the slot.


Find Patent Forward Citations

Hiranga, Hajime. (2008). Filtration systems and fitting arrangements for filtration systems (U.S. Patent No. 7338599). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7338599

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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