The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2008
Filed:
Jul. 14, 2004
Toshinari Noda, Osaka, JP;
Toshinari Noda, Osaka, JP;
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Abstract
A sputtering apparatus includes paired targetsdisposed in a vacuum chamber, substrate holderdisposed at a position nearly perpendicular to the paired targetand apart from a space formed by the paired targets, a plasma sourcefor generating reaction plasma by after-glow plasma in the vicinity of the substrate holder, and a lead-in pipewhich connects the plasma sourceto the vacuum chamber. Since reaction plasma of after-glow plasma can be produced in the vicinity of the substrate holder, it is possible to form a thin film of compound close to bulk characteristics at a low substrate temperature without the film being damaged by plasma.