The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 26, 2008

Filed:

Dec. 12, 2000
Applicants:

Cathy L. Blouin, Franklin, VT (US);

Carolyn S. Camisa, Essex Junction, VT (US);

Stephanie A. Miraglia, Burlington, VT (US);

Inventors:

Cathy L. Blouin, Franklin, VT (US);

Carolyn S. Camisa, Essex Junction, VT (US);

Stephanie A. Miraglia, Burlington, VT (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06Q 99/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method and structure for predicting semiconductor product costs at a fabricator entailing a storage medium which includes a database of historical critical dimensions and historical critical groundrules correlated to cost functions at the fabricator. The user interface has user inputs for new design parameters and new critical groundrules associated with a new device to be produced at the fabricator and a computer adapted to receive the user inputs, extract data from the storage medium, and compute semiconductor costs for the new device. The historical critical dimensions and the new critical dimensions are gate dimensions and the new critical dimensions are smaller than the historical critical dimensions. This device includes a future technology generation. Fabrication hardware and fabrication methods for producing the future technology generation are unknown and the relationships comprise base models and models that include options. The relationship comprise models that illustrate that costs increase exponentially as the historical critical dimensions and the historical critical groundrules are reduced.


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