The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 26, 2008

Filed:

Oct. 24, 2005
Applicants:

Kevin George Harding, Nishkayuna, NY (US);

Xiaoping Qian, Clifton Park, NY (US);

Russell Stephen Demuth, Berne, NY (US);

Inventors:

Kevin George Harding, Nishkayuna, NY (US);

Xiaoping Qian, Clifton Park, NY (US);

Russell Stephen DeMuth, Berne, NY (US);

Assignee:

General Electric Company, Schenectady, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for generating a mask for use with a light measurement system that includes a light source for projecting light onto a surface of an object, and an imaging system for receiving light reflected from the surface of the object. The method includes determining a profile of the object to be inspected, and generating a mask based on the determined profile, wherein the mask includes an opening extending therethrough that has a profile that substantially matches a profile of the object as viewed from the light source.


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