The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 26, 2008
Filed:
Sep. 28, 2005
Pmt-based pattern matching calibration for gamma camera using non-uniform pinhole aperture grid mask
Sharon Xiaorong Wang, Hoffman Estates, IL (US);
Ronald E. Malmin, Chicago, IL (US);
Sharon Xiaorong Wang, Hoffman Estates, IL (US);
Ronald E. Malmin, Chicago, IL (US);
Siemens Medical Solutions USA, Inc., Malvern, PA (US);
Abstract
Point source responses of pinhole apertures in a non-uniform grid mask used to spatially calibrate a gamma camera can be modeled as a two-dimensional Gaussian model function. Pinhole data from each pinhole location are added together to generate a complete Gaussian model of the flood image from the mask. The Gaussian model then is subjected to global and PMT-based pattern matching with an actual input flood image obtained using the mask, to obtain a transformed Gaussian model that is more accurately aligned with actual pinhole locations of the mask. The transformed Gaussian model then can be used in a peak detection process for calibration images, which are used to develop LC coefficients for the camera.