The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 26, 2008
Filed:
Oct. 09, 2002
Applicants:
Kunio Arai, Sendai, JP;
Hiroshi Inomata, Sendai, JP;
Richard Lee Smith, Jr., Sendai, JP;
Inventors:
Assignee:
Tohoku Techno Arch Co., Ltd., , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 17/12 (2006.01);
U.S. Cl.
CPC ...
Abstract
A system for processing supercritical and subcritical fluid capable of bringing the inside of at least one processing container () formed in a flow passage into a supercritical or subcritical high pressure field, wherein thermal operation is applied to process fluid to apply thermal expansion to the fluid to produce a pressure difference between the processing container () and the outside, whereby a specified temperature and the high pressure field suitable for the processing of the supercritical or subcritical fluid can be provided in the processing container ().